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ASTM F 47 : 1994

Superseded

Superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

Test Method for Crystalographic Perfection of Silicon by Preferential Etch Techniques (Withdrawn 1998)

Superseded date

31-12-1998

Published date

31-12-2010

CONTAINED IN VOL. 10.05 1997 Determines whether piece of silicon is monocrystalline in structure and if so, density of dislocations present. Swirls and striations may be delineated. Defects described to avoid confusion when counting dislocation etch pits.

DocumentType
Test Method
PublisherName
American Society for Testing and Materials
Status
Superseded

ASTM F 1723 : 1996 Standard Practice for Evaluation of Polycrystalline Silicon Rods by Float-Zone Crystal Growth and Spectroscopy
ASTM F 76 : 2008 : R2016 Standard Test Methods for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Single-Crystal Semiconductors
ASTM F 40 : 1983 Method for Preparing Monocrystalline Test Ingots of Silicon by the Vertical-Pulling (Czochralski) Technique (Withdrawn 1988)
MIL-STD-989 Base Document:1991 CERTIFICATION REQUIREMENTS FOR JAN SEMICONDUCTOR DEVICES
ASTM F 144 : 1980 : R2000 Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 140 : 1998 : R2008 Standard Practice for Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 144 : 1980 : R1995 : EDT 1 Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 144 : 1980 : R2010 Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 140 : 1998 : R2013 Standard Practice for<brk type="line"/> Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 144 : 1980 : R2015 Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 140 : 1998 Standard Practice for Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 144 : 1980 : R2005 Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 140 : 1998 : R2003 Standard Practice for Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 850 : 1983 : R1988 Test Method for Crystallographic Perfection of Gadolinium Gallium Garnet by Preferential Etch Techniques (Withdrawn 1992)
UNE-EN 50513:2011 Solar wafers - Data sheet and product information for crystalline silicon wafers for solar cell manufacturing
ASTM F 1404 : 1992 : R1999 Test Method for Crystallographic Perfection of Gallium Arsenide by Molten Potassium Hydroxide (KOH) Etch Technique
ASTM F 1404 : 1992 : R2007 Test Method for Crystallographic Perfection of Gallium Arsenide by Molten Potassium Hydroxide (KOH) Etch Technique (Withdrawn 2016)
ASTM F 140 : 1998 : R2020 Standard Practice for Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 144 : 1980 : R2019 Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods
ASTM F 416 : 1994 Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998)
ASTM F 76 : 2008 Standard Test Methods for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Single-Crystal Semiconductors
ASTM F 76 : 2008 : R2016 : EDT 1 Standard Test Methods for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Single-Crystal Semiconductors (Withdrawn 2023)

ASTM E 7 : 2017 : REDLINE Standard Terminology Relating to Metallography
ASTM F 416 : 1994 Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998)
ANSI B74.10 : 2015 GRADING OF ABRASIVE MICROGRITS

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