Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

Available format(s)

Hardcopy , PDF

Language(s)

English, Japanese

Published date

20-03-2005

Publisher

Japanese Standards Association

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This Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.

DocumentType	Standard
Pages	31
PublisherName	Japanese Standards Association
Status	Current

Standards	Relationship
ISO 14706:2000	Identical

Reaffirmed 2014 2005(R2014) [20/10/2014]2005(R2009) [01/10/2009]2005 [20/03/2005]

JIS B 9920:2002	Classification of air cleanliness for cleanrooms
JIS Z 8402-2:1999	Accuracy (trueness and precision) of measurement methods and results Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method

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JIS K 0148:2005

Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

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Abstract

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