14/30303365 DC : 0
NA
Status of Standard is Unknown
BS ISO/ASTM 51649 - PRACTICE FOR DOSIMETRY IN AN ELECTRON BEAM FACILITY FOR RADIATION PROCESSING AT ENERGIES BETWEEN 300 KEV AND 25 MEV
Hardcopy , PDF
English
1 Scope
2 Referenced documents
3 Terminology
4 Significance and use
5 Radiation source characteristics
6 Documentation
7 Dosimetry system selection and calibration
8 Installation qualification
9 Operational qualification
10 Performance qualification
11 Routine process control
12 Certification
13 Measurement uncertainty
14 Keywords
ANNEXES (informative) -
A1 - TYPES OF ELECTRON BEAM FACILITIES
A2 - ELECTRON BEAM DEPTH-DOSE DISTRIBUTIONS
A3 - MEASUREMENT OF DEPTH-DOSE DISTRIBUTION
A4 - CALCULATION OF ELECTRON BEAM ENERGY BASED
ON MEASURED DEPTH-DOSE DISTRIBUTION
A5 - ABSORBED DOSE AS FUNCTION OF BEAM CURRENT,
BEAM WIDTH AND CONVEYOR SPEED
A6 - MEASUREMENT OF BEAM WIDTH AND DOSE UNIFORMITY
ALONG SCAN DIRECTION
A7 - DOSE DISTRIBUTIONS FOR SCANNED AND PULSED BEAMS
A8 - DOSE DISTRIBUTION IN REFERENCE MATERIAL
A9 - PROCESS INTERRUPTION
A10 - MATERIAL PROCESSING RATES
A11 - TABLE A2 FROM ISO 11137-1
Bibliography
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