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ASTM E 1438 : 2011 : REDLINE

ASTM E 1438 : 2011 : REDLINE

Current

Current

The latest, up-to-date edition.

Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS

Available format(s)

PDF

Language(s)

English

Published date

01-11-2011

Publisher

American Society for Testing and Materials

CONTAINED IN VOL. 03.05, 2015 Defines the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens (both organic and inorganic).

1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens. This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens.

1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution.

This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Committee
E 42
DocumentType
Redline
Pages
3
PublisherName
American Society for Testing and Materials
Status
Current

BS ISO 14606:2015 Surface chemical analysis. Sputter depth profiling. Optimization using layered systems as reference materials
ISO 14606:2015 Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
DD ISO/TR 15969:2001 Surface chemical analysis. Depth profiling. Measurement of sputtered depth
ISO/TR 15969:2001 Surface chemical analysis Depth profiling Measurement of sputtered depth

ASTM E 673 : 2003 Standard Terminology Relating to Surface Analysis (Withdrawn 2012)

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