ISO 18115-1:2013
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Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy
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DIN ISO 18115-1 E : 2017
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SURFACE CHEMICAL ANALYSIS - VOCABULARY - PART 1: GENERAL TERMS AND TERMS USED IN SPECTROSCOPY (ISO 18115-1:2013)
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ASTM E 1504 : 2011 : REDLINE
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Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
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ASTM E 2695 : 2009
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Standard Guide for Interpretation of Mass Spectral Data Acquired with Time-of-Flight Secondary Ion Mass Spectroscopy (Withdrawn 2018)
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ASTM E 1127 : 2008 : R2015
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Standard Guide for Depth Profiling in Auger Electron Spectroscopy
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ASTM E 1523 : 2015 : REDLINE
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Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy
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ASTM E 984 : 2012 : REDLINE
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Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy
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ASTM E 2734/E2734M : 2010
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Standard Specification for Dimensions of Knife-Edge Flanges
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ASTM E 1881 : 2012 : REDLINE
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Standard Guide for Cell Culture Analysis with SIMS
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ASTM E 1016 : 2007 : R2012 : EDT 1
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Standard Guide for Literature Describing Properties of Electrostatic Electron Spectrometers
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ASTM E 1577 : 2011 : REDLINE
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Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis
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BS ISO 14606:2015
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Surface chemical analysis. Sputter depth profiling. Optimization using layered systems as reference materials
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ASTM E 1634 : 2011 : REDLINE
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Standard Guide for Performing Sputter Crater Depth Measurements
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BS ISO 18115 : 2001
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SURFACE CHEMICAL ANALYSIS - VOCABULARY
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ASTM E 902 : 2005
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Standard Practice for Checking the Operating Characteristics of X-Ray Photoelectron Spectrometers (Withdrawn 2011)
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DIN ISO 18115-1:2016-09 (Draft)
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SURFACE CHEMICAL ANALYSIS - VOCABULARY - PART 1: GENERAL TERMS AND TERMS USED IN SPECTROSCOPY (ISO 18115-1:2013)
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03/301546 DC : DRAFT JAN 2003
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ISO 18118 - SURFACE CHEMICAL ANALYSIS - AUGER ELECTRON SPECTROSCOPY AND X-RAY PHOTOELECTRON SPECTROSCOPY - GUIDE TO THE USE OF EXPERIMENTALLY DETERMINED RELATIVE SENSITIVITY FACTORS FOR THE QUANTITATIVE ANALYSIS OF HOMOGENEOUS MATERIALS
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BS ISO 18118:2015
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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
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ASTM E 1162 : 2011 : REDLINE
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Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
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ASTM E 1127 : 2008
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Standard Guide for Depth Profiling in Auger Electron Spectroscopy
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ISO 18115:2001
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Surface chemical analysis Vocabulary
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BS ISO 18115-1:2013
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Surface chemical analysis. Vocabulary General terms and terms used in spectroscopy
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DD ISO/TR 15969:2001
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Surface chemical analysis. Depth profiling. Measurement of sputtered depth
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ASTM E 1438 : 2011 : REDLINE
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Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
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ASTM F 1894 : 1998 : R2011
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Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)
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ASTM E 1505 : 1992 : R2001
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Standard Guide for Determining SIMS Relative Sensitivity Factors from Ion Implanted External Standards (Withdrawn 2010)
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ASTM E 2108 : 2016 : REDLINE
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Standard Practice for Calibration of the Electron Binding-Energy Scale of an X-Ray Photoelectron Spectrometer
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ISO/TR 15969:2001
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Surface chemical analysis Depth profiling Measurement of sputtered depth
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ASTM E 1880 : 2012 : REDLINE
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Standard Practice for Tissue Cryosection Analysis with SIMS
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ASTM E 1635 : 2006
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Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
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ASTM E 1635 : 2006 : R2011
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Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
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ASTM E 1505 : 1992 : R1996
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Standard Guide for Determining SIMS Relative Sensitivity Factors from Ion Implanted External Standards
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ASTM E 995 : 2016 : REDLINE
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Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
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ASTM F 1894 : 1998
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Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness
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ASTM E 1016 : 2007
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Standard Guide for Literature Describing Properties of Electrostatic Electron Spectrometers
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ISO 14606:2015
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Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
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ISO 18118:2015
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Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
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ASTM F 1894 : 1998 : R2003
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Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness
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ASTM E 1015 : 1990
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Practice for Reporting Spectra in X-Ray Photoelectron Spectroscopy (Withdrawn 1994)
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ASTM E 684 : 2004
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Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces (Withdrawn 2012)
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ASTM E 1217 : 2011 : REDLINE
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Standard Practice for Determination of the Specimen Area Contributing to the Detected Signal in Auger Electron Spectrometers and Some X-Ray Photoelectron Spectrometers
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