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I.S. EN 62047-26:2016

Current

Current

The latest, up-to-date edition.

SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 26: DESCRIPTION AND MEASUREMENT METHODS FOR MICRO TRENCH AND NEEDLE STRUCTURES

Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

01-01-2016

Preview

For Harmonized Standards, check the EU site to confirm that the Standard is cited in the Official Journal.

Only cited Standards give presumption of conformance to New Approach Directives/Regulations.

National Foreword
FOREWORD
1 Scope
2 Normative references
3 Terms and definitions
4 Description of trench structures in a micrometer scale
5 Description of needle structures in a micrometer scale
6 Measurement method
Annex A (informative) - Examples of measurement for
        trench and needle structures in a micrometer scale
Annex B (informative) - Uncertainty in dimensional measurement
Bibliography

Defines descriptions of trench structure and needle structure in a micrometer scale.

DevelopmentNote
For CENELEC adoptions of IEC publications, please check www.iec.ch to be sure that you have any corrigenda that may apply. (01/2017)
DocumentType
Standard
Pages
70
PublisherName
National Standards Authority of Ireland
Status
Current

Standards Relationship
EN 62047-26:2016 Identical

ISO 3274:1996 Geometrical Product Specifications (GPS) — Surface texture: Profile method — Nominal characteristics of contact (stylus) instruments
ISO 129-1:2004 Technical drawings Indication of dimensions and tolerances Part 1: General principles
ISO/IEC Guide 98-3:2008 Uncertainty of measurement — Part 3: Guide to the expression of uncertainty in measurement (GUM:1995)

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