• There are no items in your cart
We noticed you’re not on the correct regional site. Switch to our AMERICAS site for the best experience.
Dismiss alert

ISO 13424:2013

Current

Current

The latest, up-to-date edition.

Surface chemical analysis X-ray photoelectron spectroscopy Reporting of results of thin-film analysis

Available format(s)

Hardcopy , PDF , PDF 3 Users , PDF 5 Users , PDF 9 Users

Language(s)

English

Published date

23-09-2013

ISO 13424:2013 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS. These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by angle-resolved XPS, XPS sputter-depth profiling, peak-shape analysis, and variable photon energy XPS.

DevelopmentNote
Supersedes ISO/DIS 13424. (09/2013)
DocumentType
Standard
Pages
46
PublisherName
International Organization for Standardization
Status
Current

Standards Relationship
BS ISO 13424:2013 Identical

ISO 18118:2015 Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
ISO 15472:2010 Surface chemical analysis X-ray photoelectron spectrometers Calibration of energy scales
ISO 18115-1:2013 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy
ISO 18117:2009 Surface chemical analysis — Handling of specimens prior to analysis
ISO 21270:2004 Surface chemical analysis X-ray photoelectron and Auger electron spectrometers Linearity of intensity scale
ISO/TR 15969:2001 Surface chemical analysis Depth profiling Measurement of sputtered depth
ISO 14606:2015 Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
ISO 18116:2005 Surface chemical analysis Guidelines for preparation and mounting of specimens for analysis
ISO 19318:2004 Surface chemical analysis X-ray photoelectron spectroscopy Reporting of methods used for charge control and charge correction
ISO 24237:2005 Surface chemical analysis — X-ray photoelectron spectroscopy — Repeatability and constancy of intensity scale
ISO 16243:2011 Surface chemical analysis — Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
ISO/TR 18392:2005 Surface chemical analysis X-ray photoelectron spectroscopy Procedures for determining backgrounds
ISO 20903:2011 Surface chemical analysis Auger electron spectroscopy and X-ray photoelectron spectroscopy Methods used to determine peak intensities and information required when reporting results

View more information
£159.00
Excluding VAT

Access your standards online with a subscription

Features

  • Simple online access to standards, technical information and regulations.

  • Critical updates of standards and customisable alerts and notifications.

  • Multi-user online standards collection: secure, flexible and cost effective.