Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer

Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

31-08-2007

Publisher

British Standards Institution

Foreword
Introduction
1 Scope
2 Terms and definitions
3 Symbols and abbreviated terms
4 Principle
5 Procedure
   5.1 Generating the replica pattern
   5.2 Measurement of sputtered crater depth using a
        stylus profilometer
   5.3 Estimation of sputtering rate
6 Summary of round-robin results
Annex A (informative) Geometry of specimen surface and
                      ion gun
Annex B (informative) Dependance of replica patterns on
                      mesh-opening size
Bibliography

Explains a method for determining ion-sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) where the specimen is ion-sputtered over a region with an area between 0,4 mm[2] and 3,0 mm[2].

This Technical Report describes a method for determining ion-sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) where the specimen is ion-sputtered over a region with an area between 0,4 mm² and 3,0 mm². This Technical Report is applicable only to a laterally homogeneous bulk or single-layered material where the ion-sputtering rate is determined from the sputtered depth, as measured by a mechanical stylus profilometer, and sputtering time.

This Technical Report provides a method to convert the ion-sputtering time scale to sputtered depth in a depth profile by assuming a constant sputtering velocity. This method has not been designed for, or tested using, a scanning probe microscope system. It is not applicable to the case where the sputtered area is less than 0,4 mm² or where the sputter-induced surface roughness is significant compared with the sputtered depth to be measured.

Committee	CII/60
DevelopmentNote	Supersedes 04/30098988 DC. (08/2007)
DocumentType	Standard
Pages	28
PublisherName	British Standards Institution
Status	Current
Supersedes	04/30098988 DC : DRAFT OCT 2004

Standards	Relationship
ISO/TR 22335:2007	Identical

ISO 12179:2000	Geometrical Product Specifications (GPS) Surface texture: Profile method Calibration of contact (stylus) instruments
ISO 13565-3:1998	Geometrical Product Specifications (GPS) Surface texture: Profile method; Surfaces having stratified functional properties Part 3: Height characterization using the material probability curve
ASME B46.1 : 2009	SURFACE TEXTURE (SURFACE ROUGHNESS, WAVINESS, AND LAY)
ISO/TR 15969:2001	Surface chemical analysis Depth profiling Measurement of sputtered depth
ISO 14606:2015	Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
ISO 18115:2001	Surface chemical analysis Vocabulary
ISO 5436-1:2000	Geometrical Product Specifications (GPS) — Surface texture: Profile method; Measurement standards — Part 1: Material measures

View more information

£186.00

Excluding VAT

Product format

I agree to the DRM document license rules apply against the PDF selection made.

Please confirm that you agree to the document license rules for this document.

I agree to the document license rules .

Please confirm that you agree to the document license rules for this document.

Access your standards online with a subscription

Features

Simple online access to standards, technical information and regulations.
Critical updates of standards and customisable alerts and notifications.
Multi-user online standards collection: secure, flexible and cost effective.

Learn more on subscription solutions

Get in touch with us

Log into your Account

PD ISO/TR 22335:2007

Current

Table of Contents

Abstract

Scope

General Product Information

International Equivalents

Standards Referencing This Book

Category

Subcategory

Access your standards online with a subscription