Name: SEMI P1 : 2008E
Brand: SEMI

SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Covers the general requirements of glass substrate for hard surface photomasks.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (06/2008) E = This standard was editorially modified to correct an error. (12/2009)
DocumentType	Standard
PublisherName	Semiconductor Equipment & Materials Institute
Status	Current

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SEMI P29 : 2011	SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASKS BLANKS
SEMI P10 : 2012	SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS
SEMI D6 : 2011(R2017)	SPECIFICATION FOR LIQUID CRYSTAL DISPLAY (LCD) MASK SUBSTRATES
SEMI P48 : 2010(R2016)	SPECIFICATION OF FIDUCIAL MARKS FOR EUV MASK BLANK
SEMI P2 : 2008	SPECIFICATION FOR CHROME THIN FILMS FOR HARD SURFACE PHOTOMASKS
BS IEC 62899-301-1:2017	Printed electronics Equipment. Contact printing. Rigid master. Measurement method of plate master external dimension
SEMI T11 : 2003(R2014)	SPECIFICATION FOR MARKING OF HARD SURFACE RETICLE SUBSTRATES
SEMI P23 : 2000(R2007)	GUIDELINE FOR PROGRAMMED DEFECT MASKS AND BENCHMARK PROCEDURES FOR SENSITIVITY ANALYSIS OF MASK DEFECT INSPECTION SYSTEMS
SEMI D38 : 2011	GUIDE FOR QUALITY AREA OF LCD MASKS
SEMI P3 : 2008	SPECIFICATION FOR PHOTORESIST/E-BEAM RESIST FOR HARD SURFACE PHOTOPLATES
IEC 62899-301-1:2017	Printed electronics - Part 301-1: Equipment - Contact printing - Rigid master - Measurement method of plate master external dimension

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SEMI P1 : 2008E