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ASTM F 978 : 2002

Withdrawn
Withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

Standard Test Method for Characterizing Semiconductor Deep Levels by Transient Capacitance Techniques (Withdrawn 2003)
Available format(s)

Hardcopy , PDF

Withdrawn date

11-05-2013

Language(s)

English

Published date

01-10-2001

CONTAINED IN VOL. 10.05, 2001 Gives three methods for determining density, activation energy, and prefactor of exponential expression for emission rate of deep-level defect centers in semiconductor depletion regions by transient-capacitance techniques.

This standard was transferred to SEMI (www.semi.org) May 2003

1.1 This test method covers three procedures for determining the density, activation energy, and prefactor of the exponential expression for the emission rate of deep-level defect centers in semiconductor depletion regions by transient-capacitance techniques. Procedure A is the conventional, constant voltage, deep-level transient spectroscopy (DLTS) technique in which the temperature is slowly scanned and an exponential capacitance transient is assumed. Procedure B is the conventional DLTS (Procedure A) with corrections for nonexponential transients due to heavy trap doping and incomplete charging of the depletion region. Procedure C is a more precise referee technique that uses a series of isothermal transient measurements and corrects for the same sources of error as Procedure B.

1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Committee
F 01
DocumentType
Test Method
Pages
8
PublisherName
American Society for Testing and Materials
Status
Withdrawn
Supersedes

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