BS ISO 12406:2010
Current
The latest, up-to-date edition.
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
Hardcopy , PDF
English
11-30-2010
Foreword
Introduction
1 Scope
2 Normative references
3 Terms and definitions
4 Symbols and abbreviated terms
5 Principle
6 Reference materials
7 Apparatus
8 Specimen
9 Procedures
10 Expression of results
11 Test report
Annex A (informative) - Report of round robin test of depth
profiling of arsenic in silicon
Annex B (normative) - Procedures for the depth profiling of
NIST SRM 2134
Bibliography
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