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BS ISO 17331 : 2004

Current
Current

The latest, up-to-date edition.

SURFACE CHEMICAL ANALYSIS - CHEMICAL METHODS FOR THE COLLECTION OF ELEMENTS FROM THE SURFACE OF SILICON-WAFER WORKING REFERENCE MATERIALS AND THEIR DETERMINATION BY TOTAL-REFLECTION X-RAY FLUORESCENCE (TXRF) SPECTROSCOPY
Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

01-01-2004

Foreword
Introduction
1 Scope
2 Normative references
3 Terms and definitions
4 Abbreviations
5 Reagents
6 Apparatus
7 Specimen preparation and measurement
   environments
8 Preparation of calibration specimen
9 Making calibration curve
10 Collection of iron and/or nickel from working
   reference material
11 Determination of iron and/or nickel of working
   reference material
12 Precision
13 Test report
Annex A (informative) - International inter-laboratory
        test results
Annex B (informative) - Results of international
        inter-laboratory test programme using
        GF-AAS and ICP-MS

Provides chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy.

Committee
CII/60
DevelopmentNote
Supersedes 02/122627 DC. (04/2005) 2004 Edition Re-Issued in September 2010 & incorporates AMD 1 2010. Supersedes 09/30189522 DC. (09/2010)
DocumentType
Standard
Pages
28
PublisherName
British Standards Institution
Status
Current
Supersedes

Standards Relationship
ISO 17331:2004 Identical

ISO 14706:2014 Surface chemical analysis Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
ISO 14644-1:2015 Cleanrooms and associated controlled environments Part 1: Classification of air cleanliness by particle concentration
ISO 5725-2:1994 Accuracy (trueness and precision) of measurement methods and results Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method

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