ASTM D 5127 : 1999

1.1 This guide covers the recommendations for the purity of water suitable for use in the electronics and microelectronics industry for purposes such as the washing and rinsing of semiconductor components in cleaning and etching operations, making steam for oxidation of silicon surfaces, photomask preparation, luminescent material deposition, and similar applications relating to the development and fabrication of solid state, thin film, communication lasers, light emitting diodes, photodetector, printed circuit, memory, vacuum tube, or electrolytic devices.

1.2 The values stated in SI units are to be regarded as standard. The inch-pound units given in parentheses are for information only.

1.3 This standard does not purport to address the safety problems associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.