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ASTM F 120 : 1988

Withdrawn

Withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

Practices for Determination of the Concentration of Impurities in Single Crystal Semiconductor Materials by Infrared Absorption Spectroscopy (Withdrawn 1993)

Withdrawn date

12-31-1993

Published date

12-31-2010

CONTAINED IN VOL 10.05 1996 Determines concentration of impurities in semiconductor materials using either simple or computer assisted dispersive or Fourier transform infrared spectrophotometers. Concentration determined from intensity of infrared absorption bands characteristic of impurities. Impurity content can be determined, if transparent and has absorption bands in infrared region of spectrum.

DocumentType
Standard Practice
PublisherName
American Society for Testing and Materials
Status
Withdrawn

MIL-STD-989 Base Document:1991 CERTIFICATION REQUIREMENTS FOR JAN SEMICONDUCTOR DEVICES
ASTM F 121 : 1983 : EDT 1 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1989)
ASTM F 122 : 1974 : R1985 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1990)

ASTM F 122 : 1974 : R1985 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1990)
ASTM F 121 : 1983 : EDT 1 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1989)
ASTM E 168 : 2016 Standard Practices for General Techniques of Infrared Quantitative Analysis

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