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BS ISO 14701:2011

Withdrawn
Withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

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withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
Available format(s)

Hardcopy , PDF

Withdrawn date

11-20-2018

Language(s)

English

Published date

08-31-2011

Publisher

British Standards Institution

Foreword
Introduction
1 Scope
2 Symbols and abbreviations
3 Outline of method
4 Method for measuring the oxide thickness
Bibliography

Describes several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy.

Committee
CII/60
DevelopmentNote
Supersedes 10/30212265 DC. (08/2011)
DocumentType
Standard
Pages
24
PublisherName
British Standards Institution
Status
Withdrawn
SupersededBy
Supersedes

Standards Relationship
ISO 14701:2011 Identical

ISO 18116:2005 Surface chemical analysis Guidelines for preparation and mounting of specimens for analysis
ISO/TR 18392:2005 Surface chemical analysis X-ray photoelectron spectroscopy Procedures for determining backgrounds
ISO/IEC Guide 98-3:2008 Uncertainty of measurement — Part 3: Guide to the expression of uncertainty in measurement (GUM:1995)

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Hardcopy - English
PDF - English
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