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BS ISO 14706:2014

Current
Current

The latest, up-to-date edition.

Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

07-31-2014

Foreword
Introduction
1 Scope
2 Normative reference
3 Terms and definitions
4 Abbreviated terms
5 Principle
6 Apparatus
7 Environment for specimen preparation and measurement
8 Calibration reference materials
9 Safety
10 Measurement procedure
11 Expression of results
12 Precision
13 Test report
Annex A (informative) - Reference materials
Annex B (informative) - Relative sensitivity factor
Annex C (informative) - Preparation of reference materials
Annex D (informative) - VPD-TXRF method
Annex E (informative) - Glancing-angle settings
Annex F (informative) - International inter-laboratory test
        results
Bibliography

Defines a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.

This International Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.

The method is applicable to the following:

  • elements of atomic number from 16 (S) to 92 (U);

  • contamination elements with atomic surface densities from 1×1010 atoms/cm2 to 1×1014 atoms/cm2;

  • contamination elements with atomic surface densities from 5×108 atoms/cm2 to 5×1012atoms/cm2 using a VPD (vapour-phase decomposition) specimen preparation method (see 3.4).

Committee
CII/60
DevelopmentNote
Supersedes 99/122512 DC. (07/2005) Supersedes 13/30281604 DC. (08/2014)
DocumentType
Standard
Pages
36
PublisherName
British Standards Institution
Status
Current
Supersedes

Standards Relationship
ISO 14706:2014 Identical

ISO 14644-1:2015 Cleanrooms and associated controlled environments Part 1: Classification of air cleanliness by particle concentration
ISO 5725-2:1994 Accuracy (trueness and precision) of measurement methods and results Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method

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