OPTICS AND PHOTONICS - PREPARATION OF DRAWINGS FOR OPTICAL ELEMENTS AND SYSTEMS - PART 19: GENERAL DESCRIPTION OF SURFACES AND COMPONENTS (ISO 10110-19:2015)

Available format(s)

Hardcopy , PDF

Language(s)

German, English

Published date

04-01-2016

Publisher

German Institute for Standardisation (Deutsches Institut für Normung)

Committee	ISO/TC 172
DevelopmentNote	Supersedes DIN 58174. (06/2015)
DocumentType	Standard
Pages	17
PublisherName	German Institute for Standardisation (Deutsches Institut für Normung)
Status	Current
Supersedes	DIN 58174:2011-08 (Draft)

Standards	Relationship
ISO 10110-19:2015	Identical

DIN ISO 10110-6:2016-06	OPTICS AND PHOTONICS - PREPARATION OF DRAWINGS FOR OPTICAL ELEMENTS AND SYSTEMS - PART 6: CENTRING TOLERANCES (ISO 10110-6:2015)
DIN ISO 10110-5:2016-04	OPTICS AND PHOTONICS - PREPARATION OF DRAWINGS FOR OPTICAL ELEMENTS AND SYSTEMS - PART 5: SURFACE FORM TOLERANCES (ISO 10110-5:2015)

ISO 10110-14:2007	Optics and photonics Preparation of drawings for optical elements and systems Part 14: Wavefront deformation tolerance
ISO 10110-2:1996	Optics and optical instruments Preparation of drawings for optical elements and systems Part 2: Material imperfections Stress birefringence
ISO 10110-10:2004	Optics and photonics Preparation of drawings for optical elements and systems Part 10: Table representing data of optical elements and cemented assemblies
ISO 10110-5:2015	Optics and photonics — Preparation of drawings for optical elements and systems — Part 5: Surface form tolerances
ISO 5459:2011	Geometrical product specifications (GPS) — Geometrical tolerancing — Datums and datum systems
ISO 10110-9:2016	Optics and photonics Preparation of drawings for optical elements and systems Part 9: Surface treatment and coating
IEC 62050:2005	VHDL Register Transfer Level (RTL) synthesis
IEEE 1076.6-2004	IEEE Standard for VHDL Register Transfer Level (RTL) Synthesis
ISO/TR 14999-2:2005	Optics and photonics Interferometric measurement of optical elements and optical systems Part 2: Measurement and evaluation techniques
ISO 10110-4:1997	Optics and optical instruments Preparation of drawings for optical elements and systems Part 4: Material imperfections Inhomogeneity and striae
ISO 10110-17:2004	Optics and photonics — Preparation of drawings for optical elements and systems — Part 17: Laser irradiation damage threshold
ISO 1101:2017	Geometrical product specifications (GPS) — Geometrical tolerancing — Tolerances of form, orientation, location and run-out
ISO 10110-8:2010	Optics and photonics Preparation of drawings for optical elements and systems Part 8: Surface texture; roughness and waviness
ISO 10110-6:2015	Optics and photonics Preparation of drawings for optical elements and systems Part 6: Centring tolerances
ISO 10110-3:1996	Optics and optical instruments Preparation of drawings for optical elements and systems Part 3: Material imperfections Bubbles and inclusions
ISO 10110-12:2007	Optics and photonics Preparation of drawings for optical elements and systems Part 12: Aspheric surfaces
ISO 13584-42:2010	Industrial automation systems and integration — Parts library — Part 42: Description methodology: Methodology for structuring parts families
ISO 10110-1:2006	Optics and photonics Preparation of drawings for optical elements and systems Part 1: General
ISO 25297-1:2012	Optics and photonics Electronic exchange of optical data Part 1: NODIF information model
ISO 10110-7:2017	Optics and photonics — Preparation of drawings for optical elements and systems — Part 7: Surface imperfections
ISO 10110-11:2016	Optics and photonics Preparation of drawings for optical elements and systems Part 11: Non-toleranced data