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ISO 20341:2003

Current
Current

The latest, up-to-date edition.

Surface chemical analysis Secondary-ion mass spectrometry Method for estimating depth resolution parameters with multiple delta-layer reference materials
Available format(s)

PDF , PDF 3 Users , PDF 5 Users , PDF 9 Users

Language(s)

English

Published date

07-24-2003

Publisher

International Organization for Standardization

ISO 20341:2003 specifies procedures for estimating three depth resolution parameters, viz the leading-edge decay length, the trailing-edge decay length and the Gaussian broadening, in SIMS depth profiling using multiple delta-layer reference materials.

It is not applicable to delta-layers where the chemical and physical state of the near-surface region, modified by the incident primary ions, is not in the steady state.

DevelopmentNote
Supersedes ISO/DIS 20341 (07/2003)
DocumentType
Standard
Pages
5
PublisherName
International Organization for Standardization
Status
Current

Standards Relationship
JIS K 0169:2012 Identical
NEN ISO 20341 : 2003 Identical
BS ISO 20341:2003 Identical

08/30138809 DC : DRAFT FEB 2008 BS ISO 23812 - SURFACE CHEMICAL ANALYSIS - SECONDARY-ION MASS SPECTROMETRY - METHOD FOR DEPTH CALIBRATION FOR SILICON USING MULTIPLE DELTA-LAYER REFERENCE MATERIALS
ISO 23812:2009 Surface chemical analysis Secondary-ion mass spectrometry Method for depth calibration for silicon using multiple delta-layer reference materials
BS ISO 23812:2009 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials
NF ISO 23812 : 2009 SURFACE CHEMICAL ANALYSIS - SECONDARY ION MASS SPECTROMETRY - METHOD FOR DEPTH CALIBRATION FOR SILICON USING MULTIPLE DELTA-LAYER REFERENCE MATERIALS

ISO 18115:2001 Surface chemical analysis Vocabulary

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PDF - English
PDF 3 Users - English
PDF 5 Users - English
PDF 9 Users - English
PDF - English
PDF 3 Users - English
PDF 5 Users - English
PDF 9 Users - English
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