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JIS K 0148:2005

Current
Current

The latest, up-to-date edition.

Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Available format(s)

Hardcopy , PDF

Language(s)

English, Japanese

Published date

03-20-2005

Publisher

Japanese Standards Association

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This Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.

DocumentType
Standard
Pages
31
PublisherName
Japanese Standards Association
Status
Current

Standards Relationship
ISO 14706:2000 Identical

Reaffirmed 2014 2005(R2014) [20/10/2014]2005(R2009) [01/10/2009]2005 [20/03/2005]

JIS B 9920:2002 Classification of air cleanliness for cleanrooms
JIS Z 8402-2:1999 Accuracy (trueness and precision) of measurement methods and results Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method

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Hardcopy - English
PDF - English
Hardcopy - Japanese
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