NEN NPR ISO/TR 22335 : 2007
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SURFACE CHEMICAL ANALYSIS - DEPTH PROFILING - MEASUREMENT OF SPUTTERING RATE: MESH-REPLICA METHOD USING A MECHANICAL STYLUS PROFILOMETER
Published date
01-12-2013
Publisher
Explains a method for determining ion-sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) where the specimen is ion-sputtered over a region with an area between 0,4 mm[2] and 3,0 mm[2].
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