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SEMI C10.1 : 1994

Superseded

Superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

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superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

GUIDE FOR DETERMINATION OF METHOD DETECTION LIMITS FOR TRACE METAL ANALYSIS BY PLASMA SPECTROSCOPY

Superseded date

03-01-2005

Published date

01-12-2013

NOTE: This document was previously designated SEMI C10. Because it is a subdocument, its designation has been reassigned for ease of reference. This document is intended to provide specific procedure for the quantitative determination of the Method Detection Limit (MDL) for the analysis of trace metals by plasma spectroscopy for SEMI-specified process chemicals. Plasma Spectroscopy methods used to determine the level of trace metal impurities in SEMI- specified chemicals are based on the use of a calibration curve relating signal intensity to analyte concentration. Guide gives both a method for determining an MDL and for setting its maximum acceptable level.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. No longer available separately, included in SEMI C10. (02/2005)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Superseded
SupersededBy

SEMI M33 : 1998 TEST METHOD FOR THE DETERMINATION OF RESIDUAL SURFACE CONTAMINATION ON SILICON WAFERS BY MEANS OF TOTAL REFLECTION X-RAY FLUORESCENCE SPECTROSCOPY (TXRF)

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