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SEMI C54 : 2016

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR OXYGEN

Published date

01-12-2013

Specifies a series of specifications for different grades Of Oxygen (O[2]) that are used in the semiconductor industry.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (09/2002)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI MF1239 : 2005(R2016) TEST METHOD FOR OXYGEN PRECIPITATION CHARACTERISTICS OF SILICON WAFERS BY MEASUREMENT OF INTERSTITIAL OXYGEN REDUCTION
SEMI MF1727 : 2010(R2015) PRACTICE FOR DETECTION OF OXIDATION INDUCED DEFECTS IN POLISHED SILICON WAFERS
SEMI MF1049:2008(R2013) PRACTICE FOR SHALLOW ETCH PIT DETECTION ON SILICON WAFERS
SEMI M51 : 2012 TEST METHOD FOR CHARACTERIZING SILICON WAFER BY GATE OXIDE INTEGRITY

SEMI C3 : 2017 SPECIFICATIONS FOR GASES
SEMI C1 : 2010 GUIDE FOR THE ANALYSIS OF LIQUID CHEMICALS

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