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SEMI D21:2006(R2021)

Current

Current

The latest, up-to-date edition.

Terminology for FPD Mask Pattern Accuracy

Available format(s)

Hardcopy

Language(s)

English

Published date

02-01-2021

This Document defines terminology for FPD masks. By this Standard, it is intended that the concepts of terms which should be used at the technical conferences, business discussion, etc. are clarified and that standardization as to masks will be promoted.

DocumentType
Standard
Pages
0
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current
Supersedes

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