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SEMI M53 : 2018

SEMI M53 : 2018

Superseded

Superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

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superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

PRACTICE FOR CALIBRATING SCANNING SURFACE INSPECTION SYSTEMS USING CERTIFIED DEPOSITIONS OF MONODISPERE REFERENCE SPHERES ON UNPATTERNED SEMICONDUCTOR WAFER SURFACES

Superseded date

03-02-2019

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies calibration of scanning surface inspection system (SSIS) dark field detector channels so that the SSIS will accurately size polystyrene latex (PSL) spheres deposited on unpatterned polished, epitaxial, or filmed semiconductor wafer surfaces.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (02/2003)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Superseded
SupersededBy

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI M58 : 2009(R2014) TEST METHOD FOR EVALUATING DMA BASED PARTICLE DEPOSITION SYSTEMS AND PROCESSES
SEMI M20 : 2015 PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM
SEMI M50 : 2016 TEST METHOD FOR DETERMINING CAPTURE RATE AND FALSE COUNT RATE FOR SURFACE SCANNING INSPECTION SYSTEMS BY THE OVERLAY METHOD
SEMI M52 : 2014 GUIDE FOR SPECIFYING SCANNING SURFACE INSPECTION SYSTEMS FOR SILICON WAFERS FOR THE 130 NM TO 11 NM TECHNOLOGY GENERATIONS

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