• There are no items in your cart

SEMI M72 : 2008

Current

Current

The latest, up-to-date edition.

TEST METHOD FOR DETERMINING WAFER FLATNESS USING THE MOVING AVERAGE QUALIFICATION METRIC BASED ON SCANNING LITHOGRAPHY

Published date

01-12-2013

Covers determination of MA data arrays as well as wafer qualification quantities (one number per wafer or wafer area) derived from these arrays.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. Also available in CD-ROM. (03/2008)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI MF1530 : 2007(R2018) TEST METHOD FOR MEASURING FLATNESS, THICKNESS, AND TOTAL THICKNESS VARIATION ON SILICON WAFERS BY AUTOMATED NON-CONTACT SCANNING
SEMI M20 : 2015 PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM

View more information
Sorry this product is not available in your region.

Access your standards online with a subscription

Features

  • Simple online access to standards, technical information and regulations.

  • Critical updates of standards and customisable alerts and notifications.

  • Multi-user online standards collection: secure, flexible and cost effective.