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SEMI MF1152 : 2016

SEMI MF1152 : 2016

Current

Current

The latest, up-to-date edition.

TEST METHOD FOR DIMENSIONS OF NOTCHES ON SILICON WAFERS

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Contains a nondestructive procedure to determine whether or not the dimensions, except for the blend radius, of fiducial notches on silicon wafers fall within specified limits.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (11/2003)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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