Name: SEMI MF1724 : 2004
Brand: SEMI

TEST METHOD FOR MEASURING SURFACE METAL CONTAMINATION OF POLYCRYSTALLINE SILICON BY ACID EXTRACTION-ATOMIC ABSORPTION SPECTROSCOPY

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes the quantitative determination of surface trace metal contamination on the surface of polycrystalline silicon chunks using an acid to extract the metals from the surface.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. (10/2004)
DocumentType	Standard
PublisherName	Semiconductor Equipment & Materials Institute
Status	Current

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