Name: SEMI P22 : 2007
Brand: SEMI

GUIDELINE FOR PHOTOMASK DEFECT CLASSIFICATION AND SIZE DEFINITION

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Provides guideline to establish standard nomenclature for photomask defect classifications, and to define defect sizing methods.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (02/2007)
DocumentType	Standard
PublisherName	Semiconductor Equipment & Materials Institute
Status	Current

SEMI P29 : 2011	SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASKS BLANKS
SEMI P10 : 2012	SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS
SEMI P43 : 2004(R2011)	PHOTOMASK QUALIFICATION TERMINOLOGY
SEMI P23 : 2000(R2007)	GUIDELINE FOR PROGRAMMED DEFECT MASKS AND BENCHMARK PROCEDURES FOR SENSITIVITY ANALYSIS OF MASK DEFECT INSPECTION SYSTEMS

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SEMI P22 : 2007