SEMI PV41 : 2012

Name: SEMI PV41 : 2012
Brand: SEMI

Superseded

TEST METHOD FOR IN-LINE, NONCONTACT MEASUREMENT OF THICKNESS AND THICKNESS VARIATION OF SILICON WAFERS FOR PV APPLICATIONS USING CAPACITIVE PROBES

Superseded date

05-04-2019

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies a noncontact, high throughput in-line method for measuring wafer thickness and its total variation using capacitive probes.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. (10/2012)
DocumentType	Standard
PublisherName	Semiconductor Equipment & Materials Institute
Status	Superseded
SupersededBy	SEMI PV41 : 2012(R2019)

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