NEN ISO 12406 : 2010
Current
The latest, up-to-date edition.
SURFACE CHEMICAL ANALYSIS - SECONDARY-ION MASS SPECTROMETRY - METHOD FOR DEPTH PROFILING OF ARSENIC IN SILICON
12-01-2013
Defines a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of arsenic in silicon, and using stylus profilometry or optical interferometry for depth calibration.
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