Name: SEMI P5 : 2016
Brand: SEMI

SPECIFICATION FOR PELLICLES

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Contains the general requirements for pellicles used on photomasks or reticles in photolithographic exposure systems.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. SEMI P5.1 and SEMI P5.2 are sold as a group with their shared general specification SEMI P5. (01/2005)
DocumentType	Standard
PublisherName	Semiconductor Equipment & Materials Institute
Status	Current

SEMI D26 : 2000	PROVISIONAL SPECIFICATION FOR LARGE AREA MASKS FOR FLAT PANEL DISPLAYS (NORTH AMERICA)
SEMI E100 : 2004(R2010)	SPECIFICATION FOR A RETICLE SMIF POD (RSP) USED TO TRANSPORT AND STORE 6 INCH OR 230 MM RETICLES
SEMI F51 : 2017	GUIDE FOR ELASTOMERIC SEALING TECHNOLOGY
SEMI P10 : 2012	SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS
SEMI E111 : OCT 2017	SPECIFICATION FOR A 150 MM RETICLE SMIF POD (RSP150) USED TO TRANSPORT AND STORE A 6 INCH RETICLE
SEMI E112 : OCT 2017	SPECIFICATION FOR A 150 MM MULTIPLE RETICLE SMIF POD (MRSP150) USED TO TRANSPORT AND STORE MULTIPLE 6 INCH RETICLES

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SEMI P5 : 2016