NEN ISO 17560 : 2014
Current
Current
The latest, up-to-date edition.
SURFACE CHEMICAL ANALYSIS - SECONDARY-ION MASS SPECTROMETRY - METHOD FOR DEPTH PROFILING OF BORON IN SILICON
Published date
12-01-2013
Publisher
Defines a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon, and using stylus profilometry or optical interferometry for depth scale calibration.
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