Name: SEMI E113 : 2006(R2018)
Brand: SEMI

SPECIFICATION FOR SEMICONDUCTOR PROCESSING EQUIPMENT RF POWER DELIVERY SYSTEMS

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Process plasmas are used throughout the semiconductor industry for the etching and deposition of thin films. The majority of the process chambers use RF power to produce and sustain the plasmas.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. (11/2001)
DocumentType	Standard
PublisherName	Semiconductor Equipment & Materials Institute
Status	Current

SEMI E78 : 2012	GUIDE TO ASSESS AND CONTROL ELECTROSTATIC DISCHARGE (ESD) AND ELECTROSTATIC ATTRACTION (ESA) FOR EQUIPMENT
SEMI E10 : 2014E	SPECIFICATION FOR DEFINITION AND MEASUREMENT OF EQUIPMENT RELIABILITY, AVAILABILITY, AND MAINTAINABILITY (RAM) AND UTILIZATION
SEMI E114 : 2002E(R2016)	TEST METHOD FOR RF CABLE ASSEMBLIES USED IN SEMICONDUCTOR PROCESSING EQUIPMENT RF POWER DELIVERY SYSTEMS
SEMI E135 : 2004(R2012)	TEST METHOD FOR RF GENERATORS TO DETERMINE TRANSIENT RESPONSE FOR RF POWER DELIVERY SYSTEMS USED IN SEMICONDUCTOR PROCESSING EQUIPMENT
SEMI E115 : 2002E(R2016)	TEST METHOD FOR DETERMINING THE LOAD IMPEDANCE AND EFFICIENCY OF MATCHING NETWORKS USED IN SEMICONDUCTOR PROCESSING EQUIPMENT RF POWER DELIVERY SYSTEMS

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SEMI E113 : 2006(R2018)

SPECIFICATION FOR SEMICONDUCTOR PROCESSING EQUIPMENT RF POWER DELIVERY SYSTEMS

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