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SEMI M50 : 2016

SEMI M50 : 2016

Current

Current

The latest, up-to-date edition.

TEST METHOD FOR DETERMINING CAPTURE RATE AND FALSE COUNT RATE FOR SURFACE SCANNING INSPECTION SYSTEMS BY THE OVERLAY METHOD

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies capture rate (CR) requirements to be met by a scanning surface inspection system (SSIS) to be used for silicon wafers spanning several semiconductor technology generations.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (11/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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SEMI M40 : 2014 GUIDE FOR MEASUREMENT OF ROUGHNESS OF PLANAR SURFACES ON POLISHED WAFERS
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SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI E89 : 2007(R2013) GUIDE FOR MEASUREMENT SYSTEM ANALYSIS (MSA)
SEMI M52 : 2014 GUIDE FOR SPECIFYING SCANNING SURFACE INSPECTION SYSTEMS FOR SILICON WAFERS FOR THE 130 NM TO 11 NM TECHNOLOGY GENERATIONS

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