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SEMI M52:2021

Current

Current

The latest, up-to-date edition.

Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations

Available format(s)

Hardcopy

Language(s)

English

Published date

01-06-2021

This Guide provides recommendations for specifying scanning surface inspection systems (SSIS) for the 130, 90, 65, 45, 32, 22, 16, 11, 7, and 5 nm technology generations.

DocumentType
Revision
Pages
0
ProductNote
This standard also refers to - SEMI E1.9
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current
Supersedes

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£256.16
Excluding VAT

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