• There are no items in your cart

SEMI M84 : 2014E

Current

Current

The latest, up-to-date edition.

SPECIFICATIONS FOR POLISHED SINGLE CRYSTAL SILICON WAFERS FOR GALLIUM NITRIDE-ON-SILICON APPLICATIONS

Published date

05-06-2014

Provides ordering information and certain requirements for high-purity, single crystal polished silicon wafers used for gallium nitride-on-silicon applications. Specifications for dimensional characteristics and selected other properties are provided for three types of single crystal polished silicon wafers: - 150 mm flatted polished single crystal silicon wafers with secondary flat, - 150 mm flatted polished single crystal silicon wafers without secondary flat, and - 200 mm notched polished single crystal silicon wafers.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (04/2014) E = This standard was editorially modified in November 2017 to correct editorial errors. (01/2018)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI MF928 : 2017 TEST METHOD FOR EDGE CONTOUR OF CIRCULAR SEMICONDUCTOR WAFERS AND RIGID DISK SUBSTRATES
SEMI T3 : 2013 SPECIFICATION FOR WAFER BOX LABELS
SEMI M40 : 2014 GUIDE FOR MEASUREMENT OF ROUGHNESS OF PLANAR SURFACES ON POLISHED WAFERS

View more information
Sorry this product is not available in your region.

Access your standards online with a subscription

Features

  • Simple online access to standards, technical information and regulations.

  • Critical updates of standards and customisable alerts and notifications.

  • Multi-user online standards collection: secure, flexible and cost effective.