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SEMI M85 : 2014

SEMI M85 : 2014

Superseded

Superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

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superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

GUIDE FOR THE MEASUREMENT OF TRACE METAL CONTAMINATION ON SILICON WAFER SURFACE BY INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY

Superseded date

10-05-2020

Published date

12-02-2014

Publisher

Semiconductor Equipment & Materials Institute

Specifies the procedure for trace metal measurement, including the metal impurity collection method from a silicon wafer surface, scanning solution composition, and its optimization.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (11/2014)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Superseded
SupersededBy

SEMI M1 : 2017 SPECIFICATION FOR POLISHED SINGLE CRYSTAL SILICON WAFERS

SEMI E45 : NOV 2001(R2007) TEST METHOD FOR THE DETERMINATION OF INORGANIC CONTAMINATION FROM MINIENVIRONMENTS USING VAPOR PHASE DECOMPOSITION-TOTAL REFLECTION X-RAY SPECTROSCOPY (VPD-TXRF) AND VAPOR PHASE DECOMPOSITION-ATOMIC ABSORPTION SPECTROSCOPY (VPD/ICP-MS)
SEMI C1 : 2010 GUIDE FOR THE ANALYSIS OF LIQUID CHEMICALS

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