SEMI M85:2020
Current
Current
The latest, up-to-date edition.
Guide for the Measurement of Trace Metal Contamination on Silicon Wafer Surface by Inductively Coupled Plasma Mass Spectrometry
Available format(s)
Hardcopy
Language(s)
English
Published date
01-01-2020
Reduction of surface metal contamination below a concentration in accordance with the ITRS road map is a key issue for silicon wafer quality for most of the leading-edge technology applications.
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