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SEMI MF1529 : 2010(R2015)

SEMI MF1529 : 2010(R2015)

Current

Current

The latest, up-to-date edition.

TEST METHOD FOR SHEET RESISTANCE UNIFORMITY EVALUATION BY IN-LINE FOUR-POINT PROBE WITH THE DUAL-CONFIGURATION PROCEDURE

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies the direct measurement of the sheet resistance and its variation for all but the periphery (amounting to three probe separations) for circular conducting layers pertinent to silicon semiconductor technology.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (10/2004)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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