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SEMI MF2166 : 2010

Current

Current

The latest, up-to-date edition.

PRACTICES FOR MONITORING NON-CONTACT DIELECTRIC CHARACTERIZATION SYSTEMS THROUGH USE OF SPECIAL REFERENCE WAFERS

Published date

01-12-2013

Specifies procedures for testing these systems with the use of special reference wafers with specified characteristics. The procedures in these practices are designed to ensure that the NCDCS being evaluated provides reliable data for selected device-related parameters.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (02/2004)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI M20 : 2015 PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM
SEMI MF1153 : 2010(R2015) TEST METHOD FOR CHARACTERIZATION OF METAL-OXIDE SILICON (MOS) STRUCTURES BY CAPACITANCE-VOLTAGE MEASUREMENTS

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