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SEMI P36 : 2008(R2013)

SEMI P36 : 2008(R2013)

Current

Current

The latest, up-to-date edition.

GUIDE FOR MAGNIFICATION REFERENCE FOR CRITICAL DIMENSION MEASUREMENT SCANNING ELECTRON MICROSCOPES (CD-SEM)

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Provides guidelines: - to define common and important specifications of magnification references which are used for calibrating magnifications of critical dimension measurement scanning electron microscopes (CD-SEMs), and as the result; - to provide magnification references which are easy for anyone to use.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (03/2008)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

BS IEC 62899-301-2:2017 Printed electronics Equipment. Contact printing. Rigid master. Measurement method of plate master pattern dimension
SEMI P47 : 2007(R2013) TEST METHOD FOR EVALUATION OF LINE-EDGE ROUGHNESS AND LINEWIDTH ROUGHNESS
14/30317965 DC : 0 BS EN 62903-2 ED.1 - PRINTED ELECTRONICS - EQUIPMENT - CONTACT PRINTING - RIGID MASTER - PART 2: MEASUREMENT METHOD OF PLATE MASTER PATTERN DIMENSION
IEC 62899-301-2:2017 Printed electronics - Part 301-2: Equipment - Contact printing - Rigid master - Measurement method of plate master pattern dimension

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