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SEMI P37 : 2013

SEMI P37 : 2013

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes key specifications for EUV substrates that ensure physical dimensional compatibility with EUV carriers, process equipment, and EUV scanners. Also deals and describes key properties of EUV substrates and blanks which should be specified in the purchase order between users and suppliers.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (11/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI T16 : 2010(R2016) SPECIFICATION FOR USE OF DATA MATRIX SYMBOLOGY FOR AUTOMATED IDENTIFICATION OF EXTREME ULTRAVIOLET LITHOGRAPHY MASKS
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SEMI P48 : 2010(R2016) SPECIFICATION OF FIDUCIAL MARKS FOR EUV MASK BLANK
SEMI P38 : 2003 SPECIFICATION FOR ABSORBING FILM STACKS AND MULTILAYERS ON EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANKS
SEMI P40 : 2009(R2016) SPECIFICATION FOR MOUNTING REQUIREMENTS FOR EXTREME ULTRAVIOLET LITHOGRAPHY MASKS
SEMI E152 : 2014 MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES

SEMI P1 : 2008E SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES

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