Name: SEMI P48 : 2010(R2016)
Brand: SEMI

SPECIFICATION OF FIDUCIAL MARKS FOR EUV MASK BLANK

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes key requirements of fiducial marks that can be used as a coordinate system for referencing defect locations on EUV blanks.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. (12/2010)
DocumentType	Standard
PublisherName	Semiconductor Equipment & Materials Institute
Status	Current

BS IEC 62899-301-2:2017	Printed electronics Equipment. Contact printing. Rigid master. Measurement method of plate master pattern dimension
14/30317965 DC : 0	BS EN 62903-2 ED.1 - PRINTED ELECTRONICS - EQUIPMENT - CONTACT PRINTING - RIGID MASTER - PART 2: MEASUREMENT METHOD OF PLATE MASTER PATTERN DIMENSION
IEC 62899-301-2:2017	Printed electronics - Part 301-2: Equipment - Contact printing - Rigid master - Measurement method of plate master pattern dimension

SEMI P37 : 2013	SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS
SEMI E152 : 2014	MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES
SEMI P1 : 2008E	SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES

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SEMI P48 : 2010(R2016)