Name: SEMI P6 : 1988(R2007)
Brand: SEMI

SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Covers a defined mark placed photolithographically on photomasks for the express purpose of determining the registration accuracy of one imaged photomask to another imaged photomask within the same set of photomasks.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (06/2007)
DocumentType	Standard
PublisherName	Semiconductor Equipment & Materials Institute
Status	Current

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SEMI P6 : 1988(R2007)

SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS

Abstract

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Standards Referenced By This Book

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