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SEMI P28 : 1996(R2007)

SEMI P28 : 1996(R2007)

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR OVERLAY-METROLOGY TEST PATTERNS FOR INTEGRATED-CIRCUIT MANUFACTURE

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes several standard overlay metrology patterns which are used by metrology equipment users to evaluate and test micropatterning equipment and processes in integrated circuit (IC) manufacturing.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (06/2007)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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