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SEMI MF1771:2016(R2021)

Current

Current

The latest, up-to-date edition.

Test Method for Evaluating Gate Oxide Integrity by Voltage Ramp Technique

Available format(s)

Hardcopy

Language(s)

English

Published date

01-11-2021

The technique outlined in this Test Method is meant to standardize the procedure, analysis and reporting of oxide integrity data via the voltage ramp technique among interested parties.

DocumentType
Test Method
Pages
0
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current
Supersedes

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$251.14
Including GST where applicable

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