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NEN EN IEC 62047-2 : 2006

Current

Current

The latest, up-to-date edition.

SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 2: TENSILE TESTING METHOD OF THIN FILM MATERIALS

Published date

12-01-2013

Defines the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10 m, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices.

DocumentType
Standard
PublisherName
Netherlands Standards
Status
Current

Standards Relationship
EN 62047-2:2006 Identical
IEC 62047-2:2006 Identical

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