SEMI MF95:2007(R2023)
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Current
The latest, up-to-date edition.
Test Method for Thickness of Lightly Doped Silicon Epitaxial Layers on Heavily Doped Silicon Substrates Using an Infrared Dispersive Spectrophotometer
Available format(s)
Hardcopy
Language(s)
English
Published date
01-10-2023
This Test Method is a manual technique that requires the use of a dispersive infrared spectrophotometer.
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