SEMI MF95 : 2007(R2018)

Name: SEMI MF95 : 2007(R2018)
Brand: SEMI
Price: 125.22 GBP

Superseded

TEST METHOD FOR THICKNESS OF LIGHTLY DOPED SILICON EPITAXIAL LAYERS ON HEAVILY DOPED SILICON SUBSTRATES USING AN INFRARED DISPERSIVE SPECTROPHOTOMETER

Available format(s)

Hardcopy

Superseded date

04-11-2023

Language(s)

English

Published date

08-11-2018

Publisher

Semiconductor Equipment & Materials Institute

Gives a technique for the measurement of the thickness of epitaxial layers of silicon deposited on silicon substrates.

DevelopmentNote	Not available for sale from ILI, customer to contact SEMI. (02/2005) Also available in CD-ROM. (10/2007)
DocumentType	Standard
Pages	0
PublisherName	Semiconductor Equipment & Materials Institute
Status	Superseded
SupersededBy	SEMI MF95:2007(R2023)

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