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SEMI M9 : 2016

SEMI M9 : 2016

Superseded

Superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

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superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

SPECIFICATION FOR POLISHED MONOCRYSTALLINE GALLIUM ARSENIDE WAFERS

Superseded date

09-05-2022

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Contains two groups of substrate requirements for monocrystalline high-purity gallium arsenide wafers used in semiconductor and electronic device manufacture.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001). Includes SEMI M9.1, SEMI M9.2, SEMI M9.3, SEMI M9.4, SEMI M9.5, SEMI M9.6, SEMI M9.7 & SEMI M9.8. (09/2013)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Superseded
SupersededBy

SEMI M54 : 2004(R2011) GUIDE FOR SEMI-INSULATING (SI) GAAS MATERIAL PARAMETERS
SEMI MF928 : 2017 TEST METHOD FOR EDGE CONTOUR OF CIRCULAR SEMICONDUCTOR WAFERS AND RIGID DISK SUBSTRATES

SEMI MF533 : 2010(R2016) TEST METHODS FOR THICKNESS AND THICKNESS VARIATION OF SILICON WAFERS
SEMI MF928 : 2017 TEST METHOD FOR EDGE CONTOUR OF CIRCULAR SEMICONDUCTOR WAFERS AND RIGID DISK SUBSTRATES
SEMI MF1530 : 2007(R2018) TEST METHOD FOR MEASURING FLATNESS, THICKNESS, AND TOTAL THICKNESS VARIATION ON SILICON WAFERS BY AUTOMATED NON-CONTACT SCANNING
SEMI MF2074 : 2012 (R2018) GUIDE FOR MEASURING DIAMETER OF SILICON AND OTHER SEMICONDUCTOR WAFERS
SEMI MF154 : 2005(R2016) GUIDE FOR IDENTIFICATION OF STRUCTURES AND CONTAMINANTS SEEN ON SPECULAR SILICON SURFACES
SEMI MF523 : 2007(R2018) PRACTICE FOR UNAIDED VISUAL INSPECTION OF POLISHED SILICON WAFER SURFACES
SEMI MF671:2012 TEST METHOD FOR MEASURING FLAT LENGTH ON WAFERS OF SILICON AND OTHER ELECTRONIC MATERIALS

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